Thermal and chemical stability of hexagonal boron nitride (h-BN) nanoplatelets

Nikolaos Kostoglou, Kyriaki Polychronopoulou, Claus Rebholz

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301 Scopus citations

Abstract

High-temperature properties of boron nitride platelets (200-800 nm in width and 30-50 nm in thickness) were systematically evaluated through thermogravimetric analysis (TGA) in combination with differential scanning calorimetry (DSC). X-Ray Diffraction (XRD) studies confirmed the hexagonal graphitic-like structure of the material, while Fourier-Transform Infrared Spectroscopy (FT-IR) indicated the active vibration modes related to the B-N bond. The specific surface area (SSA), calculated by the multi-point Brunauer-Emmet-Teller (BET) method, was determined at ∼23 m2/g through N2 adsorption/desorption measurements at 77 K. Both high-temperature resistance and oxidation behavior were examined from room temperature (25 °C) up to ∼1300 °C under air-flow conditions. The h-BN platelets demonstrated a high thermal stability of up to ∼1000 °C, while their oxidation occurred in the temperature range between 1000 and 1200 °C, followed by the formation of boron oxide (B2O3).

Original languageBritish English
Pages (from-to)42-45
Number of pages4
JournalVacuum
Volume112
DOIs
StatePublished - Feb 2015

Keywords

  • Boron nitride
  • Hexagonal structure
  • High-temperature resistance
  • Nanoplatelets
  • Oxidation behavior
  • Thermogravimetric analysis

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