Suitable photo-resists for two-photon polymerization using femtosecond fiber lasers

V. P. Rajamanickam, L. Ferrara, A. Toma, R. Proietti Zaccaria, G. Das, E. Di Fabrizio, C. Liberale

Research output: Contribution to journalArticlepeer-review

10 Scopus citations


We present suitable materials with good optical and mechanical properties, simple processing, efficient and optimized for two-photon polymerization (TPP) with femtosecond fiber lasers. We selected readily available acrylic monomer Bisphenol A ethoxylate diacrylate (BPA-EDA) with three different photo-initiators (PIs), isopropyl thioxanthone (ITX), 7-diethylamino-3- thenoylcoumarin (DETC), and 4,4′ bis(diethylamino) benzophenone (BDEB), since their absorption spectra match well with the laser wavelength at 780 nm. These PIs grant efficient radical generation, reactivity and high solubility in acrylic monomers. Finally, good optical and mechanical properties are demonstrated by the fabrication of different micro-structures.

Original languageBritish English
Pages (from-to)135-138
Number of pages4
JournalMicroelectronic Engineering
StatePublished - 1 Jun 2014


  • 4,4′ Bis(diethylamino) benzophenone (BDEB)
  • 7-Diethylamino-3-thenoylcoumarin (DETC)
  • Bisphenol A ethoxylate diacrylate (BPA-EDA)
  • Femtosecond fiber laser (fs fiber laser)
  • Isopropyl thioxanthone (ITX)
  • Two-photon polymerization (TPP)


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