Strain enhanced high efficiency germanium photodetectors in the near infrared for integration with Si

  • Ali K. Okyay
  • , Ammar M. Nayfeh
  • , Krishna C. Saraswat
  • , Nevran Ozguven
  • , Ann Marshall
  • , Paul C. McIntyre
  • , Takao Yonehara

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

10 Scopus citations

Abstract

Germanium-on-silicon photodetectors with responsivities as high as 0.85A/W at 1550nm that exhibit dark currents of 100mA/cm2 and external efficiency up to 68% are demonstrated. Strain in the Ge film was determined to be 0.16%, reducing the optical bandgap by ∼12meV, resulting in a ∼20nm red shift at the absorption edge.

Original languageBritish English
Title of host publication19th Annual Meeting of the IEEE Lasers and Electro-Optics Society, LEOS
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages460-461
Number of pages2
ISBN (Print)0780395557, 9780780395558
DOIs
StatePublished - 2006
Event19th Annual Meeting of the IEEE Lasers and Electro-Optics Society, LEOS - Montreal, QC, Canada
Duration: 29 Oct 20062 Nov 2006

Publication series

NameConference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS
ISSN (Print)1092-8081

Conference

Conference19th Annual Meeting of the IEEE Lasers and Electro-Optics Society, LEOS
Country/TerritoryCanada
CityMontreal, QC
Period29/10/062/11/06

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