Strain enhanced high efficiency germanium photodetectors in the near infrared for integration with Si

Ali K. Okyay, Ammar M. Nayfeh, Krishna C. Saraswat, Nevran Ozguven, Ann Marshall, Paul C. McIntyre, Takao Yonehara

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

9 Scopus citations

Abstract

Germanium-on-silicon photodetectors with responsivities as high as 0.85A/W at 1550nm that exhibit dark currents of 100mA/cm2 and external efficiency up to 68% are demonstrated. Strain in the Ge film was determined to be 0.16%, reducing the optical bandgap by ∼12meV, resulting in a ∼20nm red shift at the absorption edge.

Original languageBritish English
Title of host publication19th Annual Meeting of the IEEE Lasers and Electro-Optics Society, LEOS
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages460-461
Number of pages2
ISBN (Print)0780395557, 9780780395558
DOIs
StatePublished - 2006
Event19th Annual Meeting of the IEEE Lasers and Electro-Optics Society, LEOS - Montreal, QC, Canada
Duration: 29 Oct 20062 Nov 2006

Publication series

NameConference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS
ISSN (Print)1092-8081

Conference

Conference19th Annual Meeting of the IEEE Lasers and Electro-Optics Society, LEOS
Country/TerritoryCanada
CityMontreal, QC
Period29/10/062/11/06

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