TY - JOUR
T1 - Silver-based surface enhanced Raman scattering (SERS) substrate fabrication using nanolithography and site selective electroless deposition
AU - Coluccio, Maria Laura
AU - Das, Gobind
AU - Mecarini, Federico
AU - Gentile, Francesco
AU - Pujia, Antonella
AU - Bava, Luisa
AU - Tallerico, Rossana
AU - Candeloro, Patrizio
AU - Liberale, Carlo
AU - De Angelis, Francesco
AU - Di Fabrizio, Enzo
PY - 2009/4
Y1 - 2009/4
N2 - In this work active SERS (surface enhanced Raman scattering) substrates are obtained by electron beam lithography and site selective electroless deposition technique. The combination of these two techniques allows to obtain well-defined metal structures, with a considerable advantage in Raman signal enhancement and in device reproducibility. The active-substrates are composed of silver, gold or a combination of the two metals, with different nanoparticles characteristics, obtained by varying metal deposition time. Rhodamine 6G was used as probe molecules for SERS experiments, showing that this new active substrate has high sensitivity to SERS response and allows to give Raman scattering also for diluted solutions (10-20 M).
AB - In this work active SERS (surface enhanced Raman scattering) substrates are obtained by electron beam lithography and site selective electroless deposition technique. The combination of these two techniques allows to obtain well-defined metal structures, with a considerable advantage in Raman signal enhancement and in device reproducibility. The active-substrates are composed of silver, gold or a combination of the two metals, with different nanoparticles characteristics, obtained by varying metal deposition time. Rhodamine 6G was used as probe molecules for SERS experiments, showing that this new active substrate has high sensitivity to SERS response and allows to give Raman scattering also for diluted solutions (10-20 M).
KW - Active SERS substrates
KW - Electroless deposition
KW - Gold
KW - Nanoparticles
KW - Raman spectroscopy
KW - Silver
UR - http://www.scopus.com/inward/record.url?scp=67349120734&partnerID=8YFLogxK
U2 - 10.1016/j.mee.2008.12.061
DO - 10.1016/j.mee.2008.12.061
M3 - Article
AN - SCOPUS:67349120734
SN - 0167-9317
VL - 86
SP - 1085
EP - 1088
JO - Microelectronic Engineering
JF - Microelectronic Engineering
IS - 4-6
ER -