Shear strength measurements of hafnium diboride thin solid films

Jungkyu Lee; Kyriaki Polychronopoulou; Andrew N. Cloud; John R. Abelson; Andreas A. Polycarpou

doi:10.1016/j.wear.2014.06.017

Shear strength measurements of hafnium diboride thin solid films

Jungkyu Lee, Kyriaki Polychronopoulou, Andrew N. Cloud, John R. Abelson, Andreas A. Polycarpou

Mechanical & Nuclear Engineering

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

Micromechanical and microscratch properties of chemical vapor deposition synthesized hafnium diboride thin solid films were measured. A range of synthesis conditions was explored by varying the substrate temperature, precursor pressure, and ex situ annealing conditions. Adhesion and shear strength measurements were performed using indentation and scratch techniques, respectively. The hardness of the as-deposited and annealed films was found to be in the 7-22. GPa and 6-32. GPa range, respectively. Scratch studies revealed a coefficient of friction of 0.13-0.21 depending on the deposition and annealing conditions with the as-deposited films exhibiting lower coefficient of friction. The adhesion strength was found to increase twofold to threefold with annealing, while annealing has no impact on the shear strength of the films.

Original language	British English
Pages (from-to)	168-176
Number of pages	9
Journal	Wear
Volume	318
Issue number	1-2
DOIs	https://doi.org/10.1016/j.wear.2014.06.017
State	Published - 15 Oct 2014

Keywords

Coating
Delamination
Hardness
Shear strength
Thin film

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10.1016/j.wear.2014.06.017

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title = "Shear strength measurements of hafnium diboride thin solid films",

abstract = "Micromechanical and microscratch properties of chemical vapor deposition synthesized hafnium diboride thin solid films were measured. A range of synthesis conditions was explored by varying the substrate temperature, precursor pressure, and ex situ annealing conditions. Adhesion and shear strength measurements were performed using indentation and scratch techniques, respectively. The hardness of the as-deposited and annealed films was found to be in the 7-22. GPa and 6-32. GPa range, respectively. Scratch studies revealed a coefficient of friction of 0.13-0.21 depending on the deposition and annealing conditions with the as-deposited films exhibiting lower coefficient of friction. The adhesion strength was found to increase twofold to threefold with annealing, while annealing has no impact on the shear strength of the films.",

keywords = "Coating, Delamination, Hardness, Shear strength, Thin film",

author = "Jungkyu Lee and Kyriaki Polychronopoulou and Cloud, {Andrew N.} and Abelson, {John R.} and Polycarpou, {Andreas A.}",

note = "Funding Information: This research was supported by the National Science Foundation under Grant no. NSF CMMI 10-30657 . The SEM, AFM and scratch measurements were obtained at the Center for Microanalysis of Materials at the University of Illinois, which is supported by the U.S. Department of Energy under Grant DEFG02-96-ER45439 . ",

year = "2014",

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day = "15",

doi = "10.1016/j.wear.2014.06.017",

language = "British English",

volume = "318",

pages = "168--176",

journal = "Wear",

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T1 - Shear strength measurements of hafnium diboride thin solid films

AU - Lee, Jungkyu

AU - Polychronopoulou, Kyriaki

AU - Cloud, Andrew N.

AU - Abelson, John R.

AU - Polycarpou, Andreas A.

N1 - Funding Information: This research was supported by the National Science Foundation under Grant no. NSF CMMI 10-30657 . The SEM, AFM and scratch measurements were obtained at the Center for Microanalysis of Materials at the University of Illinois, which is supported by the U.S. Department of Energy under Grant DEFG02-96-ER45439 .

PY - 2014/10/15

Y1 - 2014/10/15

N2 - Micromechanical and microscratch properties of chemical vapor deposition synthesized hafnium diboride thin solid films were measured. A range of synthesis conditions was explored by varying the substrate temperature, precursor pressure, and ex situ annealing conditions. Adhesion and shear strength measurements were performed using indentation and scratch techniques, respectively. The hardness of the as-deposited and annealed films was found to be in the 7-22. GPa and 6-32. GPa range, respectively. Scratch studies revealed a coefficient of friction of 0.13-0.21 depending on the deposition and annealing conditions with the as-deposited films exhibiting lower coefficient of friction. The adhesion strength was found to increase twofold to threefold with annealing, while annealing has no impact on the shear strength of the films.

AB - Micromechanical and microscratch properties of chemical vapor deposition synthesized hafnium diboride thin solid films were measured. A range of synthesis conditions was explored by varying the substrate temperature, precursor pressure, and ex situ annealing conditions. Adhesion and shear strength measurements were performed using indentation and scratch techniques, respectively. The hardness of the as-deposited and annealed films was found to be in the 7-22. GPa and 6-32. GPa range, respectively. Scratch studies revealed a coefficient of friction of 0.13-0.21 depending on the deposition and annealing conditions with the as-deposited films exhibiting lower coefficient of friction. The adhesion strength was found to increase twofold to threefold with annealing, while annealing has no impact on the shear strength of the films.

KW - Coating

KW - Delamination

KW - Hardness

KW - Shear strength

KW - Thin film

UR - http://www.scopus.com/inward/record.url?scp=84904473192&partnerID=8YFLogxK

U2 - 10.1016/j.wear.2014.06.017

DO - 10.1016/j.wear.2014.06.017

M3 - Article

AN - SCOPUS:84904473192

SN - 0043-1648

VL - 318

SP - 168

EP - 176

JO - Wear

JF - Wear

IS - 1-2

ER -

Shear strength measurements of hafnium diboride thin solid films

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Keywords

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