TY - JOUR
T1 - Self-assembled self-cleaning broadband anti-reflection coatings
AU - Askar, Khalid
AU - Phillips, Blayne M.
AU - Fang, Yin
AU - Choi, Baeck
AU - Gozubenli, Numan
AU - Jiang, Peng
AU - Jiang, Bin
N1 - Funding Information:
This work was supported by NSF under Grant No. CBET-0744879 , CMMI-1000686 , and IIP-1265139 .
PY - 2013/12/20
Y1 - 2013/12/20
N2 - Anti-reflection (AR) coatings are widely used in a spectrum of optical and optoelectronic devices, such as monitors, car dashboards, optical lenses, photodiodes, and solar cells. Narrowband quarter-wavelength single-layer and broadband multilayer dielectric AR coatings are typically fabricated by expensive and low-throughput vapor deposition processes (e.g., sputtering). Inspired by the subwavelength-structured cornea of some nocturnal moths, nanostructured broadband moth-eye AR coatings that can significantly suppress optical reflection over a wide range of wavelengths and light incident angles have been extensively exploited by both top-down and bottom-up approaches. Among many available bottom-up technologies, colloidal self-assembly is a promising approach as it is simple, fast, and inexpensive. In this review article, we will discuss two scalable colloidal self-assembly technologies based on Langmuir-Blodgett assembly and spin-coating for fabricating quarter-wavelength and moth-eye AR coatings with unique self-cleaning functionalities on transparent substrates (e.g., glass) and semiconductor wafers (such as crystalline silicon and GaAs).
AB - Anti-reflection (AR) coatings are widely used in a spectrum of optical and optoelectronic devices, such as monitors, car dashboards, optical lenses, photodiodes, and solar cells. Narrowband quarter-wavelength single-layer and broadband multilayer dielectric AR coatings are typically fabricated by expensive and low-throughput vapor deposition processes (e.g., sputtering). Inspired by the subwavelength-structured cornea of some nocturnal moths, nanostructured broadband moth-eye AR coatings that can significantly suppress optical reflection over a wide range of wavelengths and light incident angles have been extensively exploited by both top-down and bottom-up approaches. Among many available bottom-up technologies, colloidal self-assembly is a promising approach as it is simple, fast, and inexpensive. In this review article, we will discuss two scalable colloidal self-assembly technologies based on Langmuir-Blodgett assembly and spin-coating for fabricating quarter-wavelength and moth-eye AR coatings with unique self-cleaning functionalities on transparent substrates (e.g., glass) and semiconductor wafers (such as crystalline silicon and GaAs).
KW - Anti-reflection coating
KW - Biomimetics
KW - Bottom-up
KW - Colloidal crystal
KW - Nanofabrication
KW - Self-assembly
UR - http://www.scopus.com/inward/record.url?scp=84886949145&partnerID=8YFLogxK
U2 - 10.1016/j.colsurfa.2013.03.004
DO - 10.1016/j.colsurfa.2013.03.004
M3 - Article
AN - SCOPUS:84886949145
SN - 0927-7757
VL - 439
SP - 84
EP - 100
JO - Colloids and Surfaces A: Physicochemical and Engineering Aspects
JF - Colloids and Surfaces A: Physicochemical and Engineering Aspects
ER -