TY - JOUR
T1 - Scanning Voltage Microscopy for Emerging Electronic and Photonic Devices
T2 - Integrating nanotips with a single atom end for SVM
AU - Mahmud, Alam
AU - Ali, Ahmed
AU - Dhar, Rudra S.
AU - Razavipour, Seyed Ghasem
AU - Wasilewski, Zbig
AU - Rezeq, Moh'D
AU - Ban, Dayan
N1 - Publisher Copyright:
© 2007-2011 IEEE.
PY - 2017/3
Y1 - 2017/3
N2 - Scanning probe microscopy (SPM) techniques have been developed and deployed to delineate the internal characteristics of electronic and photonic devices such as doping profiles, electric potential profile, electric field profile, and charge carrier profile, as they play a crucial role in the function and performance of biased and unbiased devices. Two of the most promising techniques, scanning spreading resistance microscopy (SSRM) and scanning capacitance microscopy (SCM), are now commercially available for two-dimensional (2-D) dopant profiling by the microelectronic and optoelectronic industries, but the techniques delineate only devices at equilibrium. Therefore, to directly observe the internal behavior of operating quantum optoelectronic devices, a new SPM technique, scanning voltage microscopy (SVM), has been developed.
AB - Scanning probe microscopy (SPM) techniques have been developed and deployed to delineate the internal characteristics of electronic and photonic devices such as doping profiles, electric potential profile, electric field profile, and charge carrier profile, as they play a crucial role in the function and performance of biased and unbiased devices. Two of the most promising techniques, scanning spreading resistance microscopy (SSRM) and scanning capacitance microscopy (SCM), are now commercially available for two-dimensional (2-D) dopant profiling by the microelectronic and optoelectronic industries, but the techniques delineate only devices at equilibrium. Therefore, to directly observe the internal behavior of operating quantum optoelectronic devices, a new SPM technique, scanning voltage microscopy (SVM), has been developed.
UR - http://www.scopus.com/inward/record.url?scp=85009874251&partnerID=8YFLogxK
U2 - 10.1109/MNANO.2016.2634818
DO - 10.1109/MNANO.2016.2634818
M3 - Article
AN - SCOPUS:85009874251
SN - 1932-4510
VL - 11
SP - 4
EP - 11
JO - IEEE Nanotechnology Magazine
JF - IEEE Nanotechnology Magazine
IS - 1
M1 - 7817751
ER -