Resistive switching characteristics of TiO2 thin films with different electrodes

Jae Hyuk Shim, Quanli Hu, Mi Ra Park, Yawar Abbas, Chi Jung Kang, Jaewan Kim, Tae Sik Yoon

    Research output: Contribution to journalArticlepeer-review

    5 Scopus citations

    Abstract

    Resistive switching behaviors in metal oxides have been mentioned for several decades. TiO2 is still a well-known material for resistive switching memory devices. The resistive switching characteristics of TiO2 thin films with different top electrodes were investigated. The devices had typical bipolar resistive switching behaviors. The resistance changed from a high-resistance state (low-resistance state) to a low-resistance state (high-resistance state) under positive (negative) sweeping voltage. The interface between the top electrode and the oxide layer could affect the resistive switching behaviors. The electrical properties of Metal/TiO2/Pt devices with different top electrodes showed different switching characteristics. The conduction mechanism of the devices was also investigated. In the low-resistance state, ohmic conduction was dominant. The conduction mechanism exhibited ohmic conduction at low voltages and space-charge-limited-conduction at high voltages in the devices of Cu/TiO2/Pt, Ni/TiO2/Pt and Al/TiO2/Pt, respectively. For Ta/TiO2/Pt Schottky conduction also played an important role.

    Original languageBritish English
    Pages (from-to)936-940
    Number of pages5
    JournalJournal of the Korean Physical Society
    Volume67
    Issue number5
    DOIs
    StatePublished - 26 Sep 2015

    Keywords

    • Different top electrodes
    • Resistive switching
    • TiO thin film

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