Plasma development during picosecond laser processing of electronic materials

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@article{41f708677f5343f7a9d726f81ff64fb5,

title = "Plasma development during picosecond laser processing of electronic materials",

author = "Mao, \{Samuel S.\} and Ralph Greif and Xianglei Mao and Russo, \{Richard E.\}",

year = "2000",

month = aug,

doi = "10.1115/1.1289642",

language = "British English",

volume = "122",

pages = "424",

journal = "Journal of Heat Transfer",

issn = "0022-1481",

publisher = "American Society of Mechanical Engineers (ASME)",

number = "3",

}

TY - JOUR

T1 - Plasma development during picosecond laser processing of electronic materials

AU - Mao, Samuel S.

AU - Greif, Ralph

AU - Mao, Xianglei

AU - Russo, Richard E.

PY - 2000/8

Y1 - 2000/8

UR - https://www.scopus.com/pages/publications/84874235528

U2 - 10.1115/1.1289642

DO - 10.1115/1.1289642

M3 - Comment/debate

AN - SCOPUS:84874235528

SN - 0022-1481

VL - 122

SP - 424

JO - Journal of Heat Transfer

JF - Journal of Heat Transfer

IS - 3

ER -