Photoabsorption of BCl3 Gas under pulsed ArF excimer laser irradiation

A. Slaoui; F. Foulon; C. Fuchs; E. Fogarassy; P. Siffert

doi:10.1007/BF00324499

Photoabsorption of BCl₃ Gas under pulsed ArF excimer laser irradiation

A. Slaoui
, F. Foulon
, C. Fuchs
, E. Fogarassy
, P. Siffert

Centre de Recherches Nucleaires (IN2P3)

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

The gas immersion laser doping (GILD) technique requires the measurement of the fraction of incident light absorbed in the gas phase during the irradiation with a pulsed laser. Here we report the absorption of boron trichloride (BCl₃) gas at the wavelength of a pulsed ArF excimer laser (λ=193 nm). We have determined the one-photon (σ₁) and two-photon (σ) absorption cross sections of this dopant gas for 193 nm. The values of σ₁ and σ are 3.6×10^-20 cm² and 9×10^-45 cm⁴·s, respectively. However, the distinction between simultaneous and sequential absorption has not been possible. Based on these results, we have established a relationship which allows the calculation of the fraction of incident light absorbed as a function of incident intensity and gas pressure.

Original language	British English
Pages (from-to)	317-320
Number of pages	4
Journal	Applied Physics A Solids and Surfaces
Volume	50
Issue number	3
DOIs	https://doi.org/10.1007/BF00324499
State	Published - Mar 1990

Keywords

33.80
61.70T
61.80

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10.1007/BF00324499

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Cite this

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title = "Photoabsorption of BCl3 Gas under pulsed ArF excimer laser irradiation",

abstract = "The gas immersion laser doping (GILD) technique requires the measurement of the fraction of incident light absorbed in the gas phase during the irradiation with a pulsed laser. Here we report the absorption of boron trichloride (BCl3) gas at the wavelength of a pulsed ArF excimer laser (λ=193 nm). We have determined the one-photon (σ1) and two-photon (σ) absorption cross sections of this dopant gas for 193 nm. The values of σ1 and σ are 3.6×10-20 cm2 and 9×10-45 cm4·s, respectively. However, the distinction between simultaneous and sequential absorption has not been possible. Based on these results, we have established a relationship which allows the calculation of the fraction of incident light absorbed as a function of incident intensity and gas pressure.",

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T1 - Photoabsorption of BCl3 Gas under pulsed ArF excimer laser irradiation

AU - Slaoui, A.

AU - Foulon, F.

AU - Fuchs, C.

AU - Fogarassy, E.

AU - Siffert, P.

PY - 1990/3

Y1 - 1990/3

N2 - The gas immersion laser doping (GILD) technique requires the measurement of the fraction of incident light absorbed in the gas phase during the irradiation with a pulsed laser. Here we report the absorption of boron trichloride (BCl3) gas at the wavelength of a pulsed ArF excimer laser (λ=193 nm). We have determined the one-photon (σ1) and two-photon (σ) absorption cross sections of this dopant gas for 193 nm. The values of σ1 and σ are 3.6×10-20 cm2 and 9×10-45 cm4·s, respectively. However, the distinction between simultaneous and sequential absorption has not been possible. Based on these results, we have established a relationship which allows the calculation of the fraction of incident light absorbed as a function of incident intensity and gas pressure.

AB - The gas immersion laser doping (GILD) technique requires the measurement of the fraction of incident light absorbed in the gas phase during the irradiation with a pulsed laser. Here we report the absorption of boron trichloride (BCl3) gas at the wavelength of a pulsed ArF excimer laser (λ=193 nm). We have determined the one-photon (σ1) and two-photon (σ) absorption cross sections of this dopant gas for 193 nm. The values of σ1 and σ are 3.6×10-20 cm2 and 9×10-45 cm4·s, respectively. However, the distinction between simultaneous and sequential absorption has not been possible. Based on these results, we have established a relationship which allows the calculation of the fraction of incident light absorbed as a function of incident intensity and gas pressure.

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