TY - GEN
T1 - Model optimization of dry-out heat flux from micropillar wick structures
AU - Zhu, Yangying
AU - Lu, Zhengmao
AU - Antao, Dion S.
AU - Li, Hongxia
AU - Zhang, Tiejun
AU - Wang, Evelyn N.
N1 - Funding Information:
The authors would like to acknowledge Prof. Pierre Lermusiaux and Jing Lin at MIT for valuable discussion, and the MIT Microsystems Technology Lab for fabrication staff support and use of equipment. This work was partially funded by the Office of Naval Research (ONR) with Dr. Mark Spector as program manager (N00014-15-1-2483), the Singapore-MIT Alliance for Research and Technology (SMART), and the Cooperative Agreement between the Masdar Institute of Science and Technology (Masdar Institute), Abu Dhabi, UAE and the Massachusetts Institute of Technology (MIT), Cambridge, MA, USA-Reference 02/MI/MI/CP/11/07633/GEN/G/00.
Publisher Copyright:
© 2016 IEEE.
PY - 2016/7/20
Y1 - 2016/7/20
N2 - Capillary-driven thin film evaporation in wick structures is promising for thermal management of high-power electronics because it harnesses the latent heat of evaporation without the use of an external pumping power. The complexities associated with liquid-vapor interface and liquid flow through the wick structures, however, make it challenging to optimize the wick structure geometries to boost the dry-out heat flux. In this work, we developed a numerical model to predict the dry-out heat flux of thin film evaporation from micropillar array wick structures. The model simulates liquid velocity, pressure, meniscus curvature and contact angle along the length of the wick surface through conservation of mass, momentum and energy, based on a finite volume approach. In particular, we captured the three-dimensional meniscus shape, which varies along the wicking direction, by solving the Young-Laplace equation. We determined the dry-out heat flux upon the condition that the minimum contact angle on the micropillar surface reaches the receding contact angle. With this model, we calculated the dry-out heat flux as a function of micropillar structure geometries (diameter, pitch and height), and optimized the geometry to maximize the dry-out heat flux. Our model provides an understanding of the role of the wick structures in capillary-driven thin film evaporation and offers important design guidelines for thermal management of high-performance electronic devices.
AB - Capillary-driven thin film evaporation in wick structures is promising for thermal management of high-power electronics because it harnesses the latent heat of evaporation without the use of an external pumping power. The complexities associated with liquid-vapor interface and liquid flow through the wick structures, however, make it challenging to optimize the wick structure geometries to boost the dry-out heat flux. In this work, we developed a numerical model to predict the dry-out heat flux of thin film evaporation from micropillar array wick structures. The model simulates liquid velocity, pressure, meniscus curvature and contact angle along the length of the wick surface through conservation of mass, momentum and energy, based on a finite volume approach. In particular, we captured the three-dimensional meniscus shape, which varies along the wicking direction, by solving the Young-Laplace equation. We determined the dry-out heat flux upon the condition that the minimum contact angle on the micropillar surface reaches the receding contact angle. With this model, we calculated the dry-out heat flux as a function of micropillar structure geometries (diameter, pitch and height), and optimized the geometry to maximize the dry-out heat flux. Our model provides an understanding of the role of the wick structures in capillary-driven thin film evaporation and offers important design guidelines for thermal management of high-performance electronic devices.
KW - dry-out heat flux
KW - electronics cooling
KW - micropillar
KW - thermal management
KW - thin-film evaporation
KW - wick
UR - http://www.scopus.com/inward/record.url?scp=84983334817&partnerID=8YFLogxK
U2 - 10.1109/ITHERM.2016.7517573
DO - 10.1109/ITHERM.2016.7517573
M3 - Conference contribution
AN - SCOPUS:84983334817
T3 - Proceedings of the 15th InterSociety Conference on Thermal and Thermomechanical Phenomena in Electronic Systems, ITherm 2016
SP - 372
EP - 377
BT - Proceedings of the 15th InterSociety Conference on Thermal and Thermomechanical Phenomena in Electronic Systems, ITherm 2016
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 15th InterSociety Conference on Thermal and Thermomechanical Phenomena in Electronic Systems, ITherm 2016
Y2 - 31 May 2016 through 3 June 2016
ER -