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Micro-strip sensors based on CVD diamond

  • W. Adam
  • , E. Berdermann
  • , P. Bergonzo
  • , G. Bertuccio
  • , F. Bogani
  • , E. Borchi
  • , A. Brambilla
  • , M. Bruzzi
  • , C. Colledani
  • , J. Conway
  • , P. D'Angelo
  • , W. Dabrowski
  • , P. Delpierre
  • , A. Deneuville
  • , W. Dulinski
  • , B. Van Eijk
  • , A. Fallou
  • , F. Fizzotti
  • , F. Foulon
  • , M. Friedl
  • K. K. Gan, E. Gheeraert, G. Hallewell, S. Han, F. Hartjes, J. Hrubec, D. Husson, H. Kagan, D. Kania, J. Kaplon, R. Kass, T. Koeth, M. Krammer, A. Logiudice, R. Lu, L. Mac Lynne, C. Manfredotti, D. Meier, M. Mishina, L. Moroni, A. Oh, L. S. Pan, M. Pernicka, A. Peitz, L. Perera, S. Pirollo, M. Procario, J. L. Riester, S. Roe, L. Rousseau, A. Rudge, J. Russ, S. Sala, M. Sampietro, S. Schnetzer, S. Sciortino, H. Stelzer, R. Stone, B. Suter, R. J. Tapper, R. Tesarek, W. Trischuk, D. Tromson, E. Vittone, A. M. Walsh, R. Wedenig, P. Weilhammer, M. Wetstein, C. White, W. Zeuner, M. Zoeller
    • A-1050
    • GSI Helmholtz Centre for Heavy Ion Research GmbH
    • 91191
    • LENS - European Laboratory for Non-Linear Spectroscopy
    • University of Florence
    • IN2P3/ULP
    • Rutgers University–New Brunswick
    • Sezione di Milano
    • UMM
    • CPPM
    • LEPES
    • NIKHEF
    • Ohio State University
    • European Organization for Nuclear Research
    • Universität Hamburg
    • Carnegie Mellon University
    • University of Bristol
    • University of Toronto
    • Illinois Institute of Technology

    Research output: Contribution to journalArticlepeer-review

    18 Scopus citations

    Abstract

    The performance of a chemical vapor deposition (CVD) diamond microstrip sensor is investigated using beam tests. This sensor is proton irradiated. The state of the sensor before and after irradiation are compared.

    Original languageBritish English
    Pages (from-to)141-148
    Number of pages8
    JournalNuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
    Volume453
    Issue number1-2
    DOIs
    StatePublished - 11 Oct 2000

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