Maskless photolithography using a photon sieve on an optical fiber tip

Raquel Flores, Ricardo Janeiro, Dionísio Pereira, Jaime Viegas

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

A photon sieve inscribed on a single mode optical fiber tip by focused ion beam milling is demonstrated for maskless lithography of a photoresist with a 405 nm wavelength laser.

Original languageBritish English
Title of host publicationFrontiers in Optics, FiO 2016
DOIs
StatePublished - 21 Jul 2014
EventFrontiers in Optics, FiO 2016 - Rochester, United States
Duration: 17 Oct 201621 Oct 2016

Publication series

NameOptics InfoBase Conference Papers

Conference

ConferenceFrontiers in Optics, FiO 2016
Country/TerritoryUnited States
CityRochester
Period17/10/1621/10/16

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