KrF excimer laser projection patterned deposition of aluminum from triethylamine alane as adsorbate precursor

F. Foulon; M. Stuke

doi:10.1063/1.109459

KrF excimer laser projection patterned deposition of aluminum from triethylamine alane as adsorbate precursor

F. Foulon, M. Stuke

Max-Planck-Institut für biophysikalische Chemie

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

KrF pulsed excimer laser-induced decomposition of the triethylamine alane [(C₂H₅)₃NAlH₃] precursor in the adsorbed phase is shown to allow projection patterned deposition of Al at room temperature. The deposited height increases linearly with the laser energy dose suggesting that the decomposition is photolytically driven. Mirrorlike Al films are deposited at rates up to about one Al monolayer per pulse which corresponds to rates up to 2 μm/min when photolyzing at 100 Hz. Al films with good adhesion and resistivities down to 7.5 μΩ cm (2.5 times bulk), were deposited on quartz, Al₂O₃, and GaAs substrates. The process has good spatial selectivity. Patterns with 1 μm resolution have been generated.

Original language	British English
Pages (from-to)	2173-2175
Number of pages	3
Journal	Applied Physics Letters
Volume	62
Issue number	18
DOIs	https://doi.org/10.1063/1.109459
State	Published - 1993

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title = "KrF excimer laser projection patterned deposition of aluminum from triethylamine alane as adsorbate precursor",

abstract = "KrF pulsed excimer laser-induced decomposition of the triethylamine alane [(C2H5)3NAlH3] precursor in the adsorbed phase is shown to allow projection patterned deposition of Al at room temperature. The deposited height increases linearly with the laser energy dose suggesting that the decomposition is photolytically driven. Mirrorlike Al films are deposited at rates up to about one Al monolayer per pulse which corresponds to rates up to 2 μm/min when photolyzing at 100 Hz. Al films with good adhesion and resistivities down to 7.5 μΩ cm (2.5 times bulk), were deposited on quartz, Al2O3, and GaAs substrates. The process has good spatial selectivity. Patterns with 1 μm resolution have been generated.",

author = "F. Foulon and M. Stuke",

year = "1993",

doi = "10.1063/1.109459",

language = "British English",

volume = "62",

pages = "2173--2175",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "18",

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T1 - KrF excimer laser projection patterned deposition of aluminum from triethylamine alane as adsorbate precursor

AU - Foulon, F.

AU - Stuke, M.

PY - 1993

Y1 - 1993

N2 - KrF pulsed excimer laser-induced decomposition of the triethylamine alane [(C2H5)3NAlH3] precursor in the adsorbed phase is shown to allow projection patterned deposition of Al at room temperature. The deposited height increases linearly with the laser energy dose suggesting that the decomposition is photolytically driven. Mirrorlike Al films are deposited at rates up to about one Al monolayer per pulse which corresponds to rates up to 2 μm/min when photolyzing at 100 Hz. Al films with good adhesion and resistivities down to 7.5 μΩ cm (2.5 times bulk), were deposited on quartz, Al2O3, and GaAs substrates. The process has good spatial selectivity. Patterns with 1 μm resolution have been generated.

AB - KrF pulsed excimer laser-induced decomposition of the triethylamine alane [(C2H5)3NAlH3] precursor in the adsorbed phase is shown to allow projection patterned deposition of Al at room temperature. The deposited height increases linearly with the laser energy dose suggesting that the decomposition is photolytically driven. Mirrorlike Al films are deposited at rates up to about one Al monolayer per pulse which corresponds to rates up to 2 μm/min when photolyzing at 100 Hz. Al films with good adhesion and resistivities down to 7.5 μΩ cm (2.5 times bulk), were deposited on quartz, Al2O3, and GaAs substrates. The process has good spatial selectivity. Patterns with 1 μm resolution have been generated.

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DO - 10.1063/1.109459

M3 - Article

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JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 18

ER -

KrF excimer laser projection patterned deposition of aluminum from triethylamine alane as adsorbate precursor

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