Influence of oxygen partial pressure on wettability and photocatalytic properties of TiO2 films grown by RF magnetron sputtering

Research output: Contribution to journalReview articlepeer-review

Abstract

Titanium oxide (TiO2) thin films were deposited at 400°C by radio frequency (RF) magnetron sputtering on glass substrates. The effect of the oxygen partial pressure on the structural, morphological, hydrophilic and photocatalytic properties was studied. The structure was investigated by X-ray diffraction (XRD) and the morphology by Atomic Force Microscopy (AFM) and Scanning Electron Microscopy (SEM). The photocatalytic activity was evaluated by degradation of preadsorbed methylene blue (MB) under visible light whereas the hydrophilicity was assessed by contact angle measurements. Results show a unique way to tune the phase composition with the aim of optimizing the reactivity and wettability of titania thin films.

Original languageBritish English
Pages (from-to)15-17
Number of pages3
JournalChimica Oggi/Chemistry Today
Volume35
Issue number5
StatePublished - 1 Sep 2017

Keywords

  • Catalysis
  • Oxygen flow ratios
  • Photocatalytic properties
  • Sputtering
  • Wettability

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