High-Throughput Multi-Plume Pulsed-Laser Deposition for Materials Exploration and Optimization

Samuel S. Mao; Xiaojun Zhang

doi:10.15302/J-ENG-2015065

High-Throughput Multi-Plume Pulsed-Laser Deposition for Materials Exploration and Optimization

Samuel S. Mao
, Xiaojun Zhang

Mechanical & Nuclear Engineering

University of California, Berkeley

Research output: Contribution to journal › Article › peer-review

14 Scopus citations

Abstract

A high-throughput multi-plume pulsed-laser deposition (MPPLD) system has been demonstrated and compared to previous techniques. Whereas most combinatorial pulsed-laser deposition (PLD) systems have focused on achieving thickness uniformity using sequential multilayer deposition and masking followed by post-deposition annealing, MPPLD directly deposits a compositionally varied library of compounds using the directionality of PLD plumes and the resulting spatial variations of deposition rate. This system is more suitable for high-throughput compound thin-film fabrication.

Original language	British English
Pages (from-to)	367-371
Number of pages	5
Journal	Engineering
Volume	1
Issue number	3
DOIs	https://doi.org/10.15302/J-ENG-2015065
State	Published - 1 Sep 2015

Keywords

high-throughput
pulsed-laser deposition

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10.15302/J-ENG-2015065

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title = "High-Throughput Multi-Plume Pulsed-Laser Deposition for Materials Exploration and Optimization",

abstract = "A high-throughput multi-plume pulsed-laser deposition (MPPLD) system has been demonstrated and compared to previous techniques. Whereas most combinatorial pulsed-laser deposition (PLD) systems have focused on achieving thickness uniformity using sequential multilayer deposition and masking followed by post-deposition annealing, MPPLD directly deposits a compositionally varied library of compounds using the directionality of PLD plumes and the resulting spatial variations of deposition rate. This system is more suitable for high-throughput compound thin-film fabrication.",

keywords = "high-throughput, pulsed-laser deposition",

author = "Mao, \{Samuel S.\} and Xiaojun Zhang",

note = "Funding Information: The authors would like to thank Dr. Paul E. Burrows for critical reading of the manuscript. This research was partially supported by the US Department of Energy . Publisher Copyright: {\textcopyright} 2015 THE AUTHORS. Published by Elsevier LTD on behalf of Chinese Academy of Engineering and Higher Education Press Limited Company",

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doi = "10.15302/J-ENG-2015065",

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T1 - High-Throughput Multi-Plume Pulsed-Laser Deposition for Materials Exploration and Optimization

AU - Mao, Samuel S.

AU - Zhang, Xiaojun

N1 - Funding Information: The authors would like to thank Dr. Paul E. Burrows for critical reading of the manuscript. This research was partially supported by the US Department of Energy . Publisher Copyright: © 2015 THE AUTHORS. Published by Elsevier LTD on behalf of Chinese Academy of Engineering and Higher Education Press Limited Company

PY - 2015/9/1

Y1 - 2015/9/1

N2 - A high-throughput multi-plume pulsed-laser deposition (MPPLD) system has been demonstrated and compared to previous techniques. Whereas most combinatorial pulsed-laser deposition (PLD) systems have focused on achieving thickness uniformity using sequential multilayer deposition and masking followed by post-deposition annealing, MPPLD directly deposits a compositionally varied library of compounds using the directionality of PLD plumes and the resulting spatial variations of deposition rate. This system is more suitable for high-throughput compound thin-film fabrication.

AB - A high-throughput multi-plume pulsed-laser deposition (MPPLD) system has been demonstrated and compared to previous techniques. Whereas most combinatorial pulsed-laser deposition (PLD) systems have focused on achieving thickness uniformity using sequential multilayer deposition and masking followed by post-deposition annealing, MPPLD directly deposits a compositionally varied library of compounds using the directionality of PLD plumes and the resulting spatial variations of deposition rate. This system is more suitable for high-throughput compound thin-film fabrication.

KW - high-throughput

KW - pulsed-laser deposition

UR - https://www.scopus.com/pages/publications/85002806581

U2 - 10.15302/J-ENG-2015065

DO - 10.15302/J-ENG-2015065

M3 - Article

AN - SCOPUS:85002806581

SN - 2095-8099

VL - 1

SP - 367

EP - 371

JO - Engineering

JF - Engineering

IS - 3

ER -

High-Throughput Multi-Plume Pulsed-Laser Deposition for Materials Exploration and Optimization

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