Abstract
A high-throughput multi-plume pulsed-laser deposition (MPPLD) system has been demonstrated and compared to previous techniques. Whereas most combinatorial pulsed-laser deposition (PLD) systems have focused on achieving thickness uniformity using sequential multilayer deposition and masking followed by post-deposition annealing, MPPLD directly deposits a compositionally varied library of compounds using the directionality of PLD plumes and the resulting spatial variations of deposition rate. This system is more suitable for high-throughput compound thin-film fabrication.
Original language | British English |
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Pages (from-to) | 367-371 |
Number of pages | 5 |
Journal | Engineering |
Volume | 1 |
Issue number | 3 |
DOIs | |
State | Published - 1 Sep 2015 |
Keywords
- high-throughput
- pulsed-laser deposition