Germanium metal-semiconductor-metal photodetectors grown on Silicon using low temperature RF-PECVD

Ghada Dushaq, Ammar Nayfeh, Mahmoud Rasras

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

This paper presents a direct growth of germanium on silicon using standard RF-PECVD process at substrate temperature of 500° C. Ge Metal-Semiconductor-Metal photodetectors (MSM) are fabricated based on this growth. The structural characterization of the Ge layers and the electrical and optical properties of the fabricated MSM are investigated.

Original languageBritish English
Title of host publicationFrontiers in Optics, FiO 2017
ISBN (Electronic)9781557528209
DOIs
StatePublished - 2017
EventFrontiers in Optics, FiO 2017 - Washington, United States
Duration: 18 Sep 201721 Sep 2017

Publication series

NameOptics InfoBase Conference Papers
VolumePart F66-FiO 2017

Conference

ConferenceFrontiers in Optics, FiO 2017
Country/TerritoryUnited States
CityWashington
Period18/09/1721/09/17

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