Formation and crystallization of TiO2nano­structures on various surfaces

Ghulam Hassnain Jaffari, Tanvir Hussain, Asad Muhammad Iqbal, Yawar Abbas

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    Abstract

    A comparative study of the synthesis of TiO2 nanorods on fluorine-doped tin oxide (FTO) glass, Si, SiO2, Si/Ta, Si/TiN, Si/TiN/Ti and Si/HFO2 substrates by hydro­thermal reaction is presented. Detailed analysis on the growth of TiO2 on pre-Annealed Si/TiN/Ti and HfO2 (HFO) surfaces is also given. For Si/TiN/Ti, a pre-Annealing procedure led to the transformation of Ti to a TiO2 layer which acts as a seed for aligned growth of TiO2 nanorods. In contrast, Si/HFO does not provide a nucleation site for the formation of aligned nanorods. Various samples were prepared by varying the synthesis conditions, i.e. pre-and post-Annealing temperatures and hydro­thermal reaction time to figure out the optimum conditions which lead to unidirectional and highly aligned nanorods. X-ray diffraction, scanning electron microscopy, ultraviolet-visible spectroscopy and Raman spectroscopy were used to study structural, morphological and optical properties of synthesized samples. It is found that TiO2 nanorods exhibit a rutile phase on the Si/Ti/TiN and Si/HFO substrates, but highly oriented vertical growth of nanorods has been observed only on pre-Annealed Si/TiN/Ti substrates. On the other hand, TiO2 nanorods form dandelion-like structures on Si/HFO substrates. Growth of vertically oriented TiO2 nanorods on Si/TiN/Ti is attributed to the TiO2 seed layer which forms after the process of pre-Annealing of substrates at a suitable temperature. Variation in hydro­thermal reaction time and post-Annealing temperature brings further improvement in crystallinity and morphology of nanorods. This work shows that the pre-Annealed Si/TiN/Ti substrate is the optimal choice to achieve vertically oriented, highly aligned TiO2 nanorods.

    Original languageBritish English
    Pages (from-to)593-605
    Number of pages13
    JournalActa Crystallographica Section B: Structural Science, Crystal Engineering and Materials
    Volume78
    DOIs
    StatePublished - 1 Aug 2022

    Keywords

    • oriented growth
    • seed layer
    • thin films
    • TiOnanorods

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