Erratum: Laser-projection-patterned etching of GaAs in a chlorine atmosphere (Journal of Applied Physics (1992) 71 (2898))

Research output: Contribution to journal › Comment/debate

Access to Document

@article{2a98cf7ab70748989eef5da8bda36d45,

title = "Erratum: Laser-projection-patterned etching of GaAs in a chlorine atmosphere (Journal of Applied Physics (1992) 71 (2898))",

author = "F. Foulon and Mino Green and Goodall, \{F. N.\} and \{De Unamuno\}, S.",

year = "1992",

doi = "10.1063/1.352369",

language = "British English",

volume = "72",

pages = "3225",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "7",

}

TY - JOUR

T1 - Erratum

T2 - Laser-projection-patterned etching of GaAs in a chlorine atmosphere (Journal of Applied Physics (1992) 71 (2898))

AU - Foulon, F.

AU - Green, Mino

AU - Goodall, F. N.

AU - De Unamuno, S.

PY - 1992

Y1 - 1992

UR - https://www.scopus.com/pages/publications/36449003935

U2 - 10.1063/1.352369

DO - 10.1063/1.352369

M3 - Comment/debate

AN - SCOPUS:36449003935

SN - 0021-8979

VL - 72

SP - 3225

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 7

ER -