Effect of buffer layer deposition on diameter and alignment of carbon nanotubes in water-assisted chemical vapor deposition

Shashikant P. Patole, Jae Hun Jeong, Seong Man Yu, Ha Jin Kim, Jae Hee Han, In Taek Han, Ji Beom Yoo

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

Vertically aligned carbon nanotubes (CNTs) grown by water-assisted chemical vapor deposition have revealed differences in structure and morphology depending on the deposition rate of the Al buffer layer. Rearrangement of the Fe catalyst during CNT growth is mainly influenced by the buffer layer topography, which in turn depends on the buffer layer deposition rate. A higher deposition rate makes the substrate rougher and causes the growth of more aligned, low diameter CNTs with greater height. In contrast, slow deposition results in a smooth surface, which grows misaligned, large diameter CNTs with less height. Based on the results, a CNT growth model has been proposed.

Original languageBritish English
Pages (from-to)32-38
Number of pages7
JournalApplied Surface Science
Volume271
DOIs
StatePublished - 15 Apr 2013

Keywords

  • Buffer layer
  • Carbon nanotubes
  • Catalyst
  • Growth mechanism
  • Surface topography

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