Compact silicon TE-pass polarizer using adiabatically-bent fully-etched waveguides

  • Humaira Zafar
  • , Paulo Moreira
  • , Ayat M. Taha
  • , Bruna Paredes
  • , Marcus S. Dahlem
  • , Anatol Khilo

Research output: Contribution to journalArticlepeer-review

58 Scopus citations

Abstract

A high-performance integrated silicon TE-pass polarizer is proposed and demonstrated. The polarizer uses a series of adiabatic waveguide bends that yield high extinction ratio for the TM polarization and low insertion loss for the TE polarization, and does not require special materials or complex fabrication steps. The polarizer, implemented on a silicon-on-insulator platform with a 220 nm silicon thickness, is measured to have insertion loss ≤ 0.37 dB (average 0.12 dB) and extinction ratio ≥ 27.6 dB (average 36.0 dB) over a 1.5 µm to 1.6 µm wavelength range, with a footprint of 63 µm × 9.5 µm. The trade-off between the footprint of the polarizer and its performance is established. While the analysis was done for a silicon-on-insulator platform, the concept is applicable to other waveguide geometries and integrated photonic platforms.

Original languageBritish English
Pages (from-to)31850-31860
Number of pages11
JournalOptics Express
Volume26
Issue number24
DOIs
StatePublished - 26 Nov 2018

Fingerprint

Dive into the research topics of 'Compact silicon TE-pass polarizer using adiabatically-bent fully-etched waveguides'. Together they form a unique fingerprint.

Cite this