Characterization of new a-Si:H detectors fabricated from amorphous silicon deposited at high rate by helium enhanced PECVD

T. Pochet, A. Ilie, F. Foulon, B. Equer

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    Abstract

    This paper is concerned with the characterization of new detectors fabricated from a-Si:H films deposited at high rates through the dilution of SiH4 in Helium. Rates up to ten times (5.5 μm/h) that of the standard technique are obtained. We have investigated the electrical characteristics -depletion voltage, residual space charge density- of the helium diluted material and compared them to that of the standard material. Finally, the response of detectors, fabricated from both materials, to 5.5 MeV alpha particles are compared.

    Original languageBritish English
    Title of host publicationIEEE Nuclear Science Symposium & Medical Imaging Conference
    Pages450-454
    Number of pages5
    Editionpt 1
    StatePublished - 1994
    EventProceedings of the 1993 IEEE Nuclear Science Symposium & Medical Imaging Conference - San Francisco, CA, USA
    Duration: 30 Oct 19936 Nov 1993

    Publication series

    NameIEEE Nuclear Science Symposium & Medical Imaging Conference
    Numberpt 1

    Conference

    ConferenceProceedings of the 1993 IEEE Nuclear Science Symposium & Medical Imaging Conference
    CitySan Francisco, CA, USA
    Period30/10/936/11/93

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