Carbon doped 980 nm InGaAs strained quantum well lasers grown by metallorganic chemical-vapor deposition

Tao Yin, Peng Lian, Zuntu Xu, Changhua Chen, Hongdong Zhao, Deshu Zou, Jianxin Chen, Guo Gao, Jinyu Du, Changbao Tao, Guangdi Shen, Hui Lu, Lianxi Zheng, Lianghui Chen

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Abstract

Graded-index separate-confinement (GRIN-SCH) strained quantum well (QW) InGaAs/GaAs/GaAlAs lasers grown by metallorganic chemical-vapor deposition (MOCVD) with carbon tetrachloride used as p-doped source for upper cladding layer and the capping layer are studied. By SIMS and electrochemical capacitance-voltage measurements, the desirable quantum well structure and the suitable doping and carrier concentrations profiles are found to be obtained. The grown crystals show good optical characteristics through the photoluminescence (PL) spectrum measurement of the upper cladding layer and the active layer. The oxide-stripe and the ridge waveguide stripe lasers are fabricated, the lower threshold current densities 160 A/cm2 (uncoated) with 1500 μm long cavity are obtained. The differential quantum efficiency and the output power can be up to 0.4 W/A and 500 mw (uncoated).

Original languageBritish English
Pages (from-to)48-53
Number of pages6
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3547
StatePublished - 1998
EventProceedings of the 1998 Conference on Semiconductor Lasers III - Beijing, China
Duration: 16 Sep 199818 Sep 1998

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