Abstract
Plasmonic nanostar-dimers, decoupled from the substrate, have been fabricated by combining electron-beam lithography and reactive-ion etching techniques. The 3D architecture, the sharp tips of the nanostars and the sub-10 nm gap size promote the formation of giant electric-field in highly localized hot-spots. The single/few molecule detection capability of the 3D nanostar-dimers has been demonstrated by Surface-Enhanced Raman Scattering.
Original language | British English |
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Pages (from-to) | 2353-2358 |
Number of pages | 6 |
Journal | Advanced Materials |
Volume | 26 |
Issue number | 15 |
DOIs | |
State | Published - 16 Apr 2014 |
Keywords
- electron-beam lithography
- nanostructures
- plasmonics
- single-molecule surface-enhanced Raman scattering
- sub-10-nm gap