Abstract
In this work, the effect of embedding Silicon Nanoparticles (Si-NPs) in ZnO based charge trapping memory devices is studied. Si-NPs are fabricated by laser ablation of a silicon wafer in deionized water followed by sonication and filtration. The active layer of the memory was deposited by Atomic Layer Deposition (ALD) and spin coating technique was used to deliver the Si-NPs across the sample. The nanoparticles provided a good retention of charges (>10 years) in the memory cells and allowed for a large threshold voltage (Vt) shift (3.4 V) at reduced programming voltages (1 V). The addition of ZnO to the charge trapping media enhanced the electric field across the tunnel oxide and allowed for larger memory window at lower operating voltages.
| Original language | British English |
|---|---|
| Title of host publication | Proceedings of the IEEE Conference on Nanotechnology |
| Publisher | Institute of Electrical and Electronics Engineers Inc. |
| Pages | 505-509 |
| Number of pages | 5 |
| ISBN (Electronic) | 9781479956227 |
| DOIs | |
| State | Published - 26 Nov 2014 |
| Event | 2014 14th IEEE International Conference on Nanotechnology, IEEE-NANO 2014 - Toronto, Canada Duration: 18 Aug 2014 → 21 Aug 2014 |
Publication series
| Name | Proceedings of the IEEE Conference on Nanotechnology |
|---|---|
| ISSN (Electronic) | 1944-9399 |
Conference
| Conference | 2014 14th IEEE International Conference on Nanotechnology, IEEE-NANO 2014 |
|---|---|
| Country/Territory | Canada |
| City | Toronto |
| Period | 18/08/14 → 21/08/14 |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
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SDG 7 Affordable and Clean Energy
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