Reactive Ion Etcher Cl-

The RIE-200iP Chlorine RIE is a load lock type high precision plasma reactive ion etching system that can be used to etch all types of semiconducting, insulating films. It includes all the features of the open-load platform but adds a surface treated protective shield that is raised during substrate loading. The shield protects the condition of the slit valve seal, and also improves uniformity. The SAMCO Fluorine system uses several different gasses as the source for Chlorine ions which are active on dielectrics and compound semiconductors such as GaAs, and InP. Photoresist can be used to mask but does not have really good selectivity as it is aggressively attacked by the Chlorine chemistry, deeper etch runs can be made using Oxide or Nitride masks. Metals are not allowed in this tool.