Plasma Sputter deposition

    Equipment/facility: Equipment

    • LocationShow on map

      Masdar Institute, 1A, Undercroft, Micro/Nanofabrication Facility, Bay 2

    Equipments Details


    The AJA Orion 300 sputterer is a versatile, load locked PVD system with 5 magnetron, 2 RF, substrate biasing and in-situ heating. It also comes with a dual output, DC power supply. The RF supplies can go up to a maximum of 600W (ramping). The heater can go up to 400C with PID control. A large variety of materials can be deposited in this system. Contact staff if you’d like to deposit (add your material) into our rotation list. Process Gasses Available: Ar, O2


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