Photoresist Developing Station

    Equipment/facility: Equipment

    • LocationShow on map

      Masdar Institute, 1A, Undercroft, Micro/Nanofabrication Facility, Bay 4

    Equipments Details


    The purpose of the Photoresist Developer bench is to use base/alkaline chemistries to develop photoresists exposed in the UV aligner system. The bench has a manual, photoresist spinner, two hotplates and ambient tank and a quick dump rinser.


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