KOH/Base bench

    Equipment/facility: Equipment

    • LocationShow on map

      Masdar Institute, 1A, Undercroft, Micro/Nanofabrication Facility, Bay 4

    Equipments Details


    The silicon etch wet bench uses dilute potassium hydroxide (KOH) to preferentially etch silicon along the material's crystal planes. The process is used to form windows in silicon for fabricating membranes and to shape silicon parts for microelectromechanical systems. The bench can accommodate substrates ranging from 200 mm diameter wafers down to small pieces.


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