Ebeam Evaporator

The Temescal BJD-2000 E-beam Evaporator is used for the deposition of metals and oxide films. The system features a six pocket E-gun. The system also has an extended chamber for a larger distance between source and sample to avoid excessive heating during thick metallisation for lift-off processes. The system is ideal for Ohmic and Schottky contacts in Silicon & III-V compound devices. Materials available in this tool are Cr, Ti, Ag, Al and ITO. The 6th pocket is empty and users are allowed to insert their materials for deposition, provided the appropriate liner and materials are procured with advance permission by the Micro & Nanofabrication Centre staff.