Equipments Details
Description
The Raith e-LiNE is an electron beam lithography tool with a 100 mm by 100 mm travel range. It uses Thermal Field Emission filament technology and a laser-interferometer controlled stage. The column voltage varies from 100 V to 30 kV and the laser stage moves with a precision of 2 nm. There are six apertures on the system: 7.5, 10, 20, 30, 60, and 120 um. The electron beam current is controlled by selecting the appropriate aperture. The system is equipped with a load lock, an automatic height laser sensor, an Inlens detector and a SE2 detector, with a unique fixed beam moving stage (FBMS) capability. Typically, large design patterns are divided into small writing fields, which are then stitched together to form the final pattern. The standard writing field size is 100 um square, with 2 nm pixel size, but the writing fields size can vary from 500 nm up to 2 mm square. Within one writing field, the ebeam is deflected to expose one pixel after another sequentially. When running in FBMS mode, the beam position is fixed and ONLY the stage moves. This allows the writing of long features without much stitching error, a function useful to applications such as waveguides. Finally, three comprehensive software packages for proximity effect corrections, 3-D lithography, and metrology complete the tool.

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